News

Intel has not yet fully committed to using the new High-NA EUV chipmaking tool in production and has an alternative ...
ASML leads the EUV lithography market, driving advanced chipmaking with High-NA systems. Read more about their plans to grow ...
Amid escalating tech restrictions and geopolitical tensions, China has made a breakthrough in semiconductor research. The ...
TSMC reportedly still won't use new High-NA EUV lithography machines for its next-gen A14 (1.4nm) process node, will rely on ...
China’s SMIC has reportedly produced 5nm chips without EUV using DUV and SAQP, signaling a bold shift in chipmaking amid ...
Still, with a virtual monopoly on EUV lithography, ASML remains well-positioned long term. The company has also introduced a new technology called a high numerical aperture extreme ultraviolet ...
Nvidia has recently informed its partners that the sales of the GeForce RTX 5090D are temporarily suspended in China. The company has yet to officially confirm these rumors, but reports suggest ...
Producing 2nm chips requires cutting-edge techniques like extreme ultraviolet (EUV) lithography. This complex and expensive process increases production costs and demands extremely high precision.
ASML provided a detailed update on its extreme ultraviolet (EUV) lithography systems during its latest earnings call, emphasizing advancements in both High NA and Low NA platforms as key ...
The silicon frontside interconnects are freed up for routing signal interconnects only, and can even lower cost due to fewer expensive EUV lithography steps. “There’s a large cost benefit to just ...
Delft, The Netherlands / Hsinchu, Taiwan -- Ocotober 13, 2008 -- MAPPER Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) signed an agreement, according to which MAPPER will ship its ...
CDU is a major contributor to yield drop out in deep sub micron technologies and a big concern to the lithography process. Both the Intra field and the inter field type of CD variations can be ...