Abstract: Colloidal ceria slurry is expected to be a candidate of alternative slurry for oxide film CMP because the slurry particles are small and have a regular shape comparing to conventional ...

The stagnant CMP business at CMC ... Glass platens are planarized with ceria slurry and used primarily in client applications (mobile) as shown in Chart 2. These are being replaced by SSDs.

Abstract: Post CMP cleaning is a very important step to remove the CMP slurry abrasive from wafer surface and get rid of the CMP particles defects. In this paper, we studied the relationship between ...

The CMP slurry is an elaborate combination of chemicals and nano ... all abrasives used in this study are overly concentrated to measure without dilution. Figure 2. Ceria abrasive correlation function ...