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Abstract: The etch dynamics of low-density undoped silica glass oxide (USG) and Si-rich SiN x:H thin films in a 25-wafer batch vapor HF tool operating at low etching pressure were studied. Up to ...
We report the fabrication of nanoporous silicon (nPSi) electrodes via electrochemical etching to form a porous Si layer with controllable thickness and pore size. Varying the etching time and ...
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