Abstract: Plasma-assisted atomic layer deposition (PALD) was carried out for growing thin oxide films containing dopants for silicon, germanium, and SiGe onto flat and high-aspect ratio substrates.

They do this by converting liquid photopolymers (a special type of plastic) into solid 3D objects, one layer at a time ... ZCorp Spectrum z510 9) Material Jetting (MJ) Polyjet and Wax Casting ...